Direct growth of epitaxial La0.67Ca0.33MnO3-δ thin films

被引:3
作者
Campillo, G
Castro, LF
Vivas, P
Baca, E [1 ]
Prieto, P
Arias, D
Santamaría, J
Berger, A
Bader, SD
机构
[1] Univ Valle, Dept Fis, AA-25360 Cali, Colombia
[2] Univ Complutense Madrid, GFMC, Dept Fis Aplicada 3, E-28040 Madrid, Spain
[3] Argonne Natl Lab, Argonne, IL 60439 USA
关键词
D O I
10.1142/S0218625X02004086
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
La0.67Ca0.33MnO3-delta thin films were deposited using a high-pressure dc-sputtering process. Pure oxygen at a pressure of 3.8 mbar was used as sputtering gas. The films were grown on (001) LaAlO3 and (001) SrTiO3 substrates at heater temperature of 850degreesC without any annealing treatment. The formation of highly a-axis-oriented films with sharp interface with substrate surface is demonstrated by X-ray diffraction, transmission electron microscope (TEM), and atomic force microscope (AFM) analysis. Electrical characterization revealed a metal-insulator transition at T-MI approximate to 276 K, and magnetic characterization showed good magnetic properties with a PM-FM transition at T-C approximate to 262 K.
引用
收藏
页码:1611 / 1615
页数:5
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