History and Future of FPD's and Semiconductors

被引：0
|
作者：
Todokoro, Yoshihiro [1 ,2 ]
Imai, Shigeki [1 ]
Matsumoto, Taketoshi [1 ]
Unate, Takao [3 ]
机构：
[1] Osaka Univ, 8-1 Mihogaoka, Osaka 5670047, Japan
[2] Nara Inst Sci & Technol, Nara 6300192, Japan
[3] Unate, Sakai, Osaka, Japan
来源：
IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 1 | 2012年 / 19卷
关键词：
FPD; Semiconductor; History; Future;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
History of semiconductors has been reviewed in miniaturization, increasing wafer size, introduction of new materials, and integration of new functions. History of FPD's has been reviewed in frontplane and backplane. Feedbacks from the history of semiconductors to FPD's have been discussed.
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页码：463 / 466
页数：4
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