MOCVD growth of porous cerium oxide thin films on silicon substrate

被引：12

作者：

Avril, L. ^{[1
]}

Zanfoni, N. ^{[1
]}

Simon, P. ^{[1
]}

Imhoff, L. ^{[1
]}

Bourgeois, S. ^{[1
]}

Domenichini, B. ^{[1
]}

机构：

[1] Univ Bourgogne, CNRS, UMR 6303, Lab ICB, F-21078 Dijon, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2015年 / 280卷

关键词：

Porous CeO2; DLI-MOCVD; Microstructure; XPS; CHEMICAL-VAPOR-DEPOSITION; ALKOXIDE PRECURSOR; CEO2; SPECTROSCOPY; SURFACES; PHOTOELECTRON; PHOTOEMISSION; REDUCTION; CATALYSTS;

D O I：

10.1016/j.surfcoat.2015.07.055

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Porous cerium oxide thin films were grown by pulsed direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) on silicon substrate, using cerium tetrakis (1-methoxy-2-methyl-2-propanolate) dissolved in cyclohexane as precursor as well as oxygen as oxidant agent. The chemical and morphological characteristics of the films were investigated by XPS, SEM and TEM. The influence of the growth conditions on the morphological features of the thin films and the cerium chemical states are reported and discussed. The decrease of the oxygen and/or alkoxide flow rate induces the decrease of both the film thickness and the porosity of the layer. Moreover, the growth of silicate at the interface between the silicon substrate and the grown film is evidenced. (C) 2015 Published by Elsevier B.V.

引用

页码：148 / 153

页数：6

共 31 条

[1] Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO2 [J].

Aspinall, Helen C. ;

Bacsa, John ;

Jones, Anthony C. ;

Wrench, Jacqueline S. ;

Black, Kate ;

Chalker, Paul R. ;

King, Peter J. ;

Marshall, Paul ;

Werner, Matthew ;

Davies, Hywel O. ;

Odedra, Rajesh .

INORGANIC CHEMISTRY, 2011, 50 (22) :11644-11652

[2] Alumina particle reinforced TiO2 composite films grown by direct liquid injection MOCVD [J].

Avril, L. ;

Boudon, J. ;

de Lucas, M. C. Marco ;

Imhoff, L. .

VACUUM, 2014, 107 :259-263

[3] Toward the innovative synthesis of columnar CeO2 nanostructures [J].

Barreca, Davide ;

Gasparotto, Alberto ;

Maccato, Chiara ;

Maragno, Cinzia ;

Tondello, Eugenio .

LANGMUIR, 2006, 22 (21) :8639-8641

[4] Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometric films [J].

Brevet, A. ;

Imhoff, L. ;

de Lucas, M. C. Marco ;

Domenichini, B. ;

Bourgeois, S. .

THIN SOLID FILMS, 2007, 515 (16) :6407-6410

[5] Selective catalytic reduction of NO over carbon nanotubes supported CeO2 [J].

Chen, Xiongbo ;

Gao, Shan ;

Wang, Haiqiang ;

Liu, Yue ;

Wu, Zhongbiao .

CATALYSIS COMMUNICATIONS, 2011, 14 (01) :1-5

[6] Room-temperature synthesis and characterization of porous CeO2 thin films [J].

Chu, Dewei ;

Masuda, Yoshitake ;

Ohji, Tatsuki ;

Kato, Kazumi .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2012, 209 (01) :139-142

[7] Fluidized bed catalytic chemical vapor deposition synthesis of carbon nanotubes-A review [J].

Danafar, Firoozeh ;

Fakhru'l-Razi, A. ;

Salleh, Mohd Amran Mohd ;

Biak, Dayang Radiah Awang .

CHEMICAL ENGINEERING JOURNAL, 2009, 155 (1-2) :37-48

[8] CVD elaboration and in situ characterization of barium silicate thin films [J].

Geneves, Thomas ;

Imhoff, Luc ;

Domenichini, Bruno ;

Peterle, Paul Maurice ;

Bourgeois, Sylvie .

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2010, 30 (02) :441-446

[9] Preparation of iridium clusters by MOCVD and their electrochemical properties [J].

Goto, T ;

Vargas, JR ;

Hirai, T .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1996, 217 :223-226

[10] CeO2 on Si(111) 7 X 7 and Si(111)-H 1 X 1, an interface study by high-resolution photoelectron spectroscopy [J].

Hirschauer, B ;

Göthelid, M ;

Janin, E ;

Lu, H ;

Karlsson, UO .

APPLIED SURFACE SCIENCE, 1999, 148 (3-4) :164-170

← 1 2 3 4 →