Localized removal of a photoresist by atmospheric pressure micro-plasma jet using RF corona discharge

Atmospheric pressure micro-plasma jet (mu-PJ) was generated at the tip of a stainless steel surgical needle with an inner diameter of 0.4-0.5 mm and with a length of 19-25 min using RF (13.56MHz) corona discharge. The He mu-PJ spouted to a free space at a power of less than 10W. The He atomic excitation temperature (T-exc) estimated by means of an optical emission spectrum was 3270 K at a gas flow rate of 350 seem and T-exc. decreased with increasing gas flow rate. The O-2 mu-PJ was also generated at a power of 12 W and it was applied to the localized removal of a photoresist.