Use of a PECVD-PVD process for the deposition of copper containing organosilicon thin films on steel

被引：33

作者：

Daniel, A. ^{[1
,2
]}

Le Pen, C. ^{[1
]}

Archambeau, C. ^{[1
]}

Reniers, F. ^{[2
]}

机构：

[1] ArcelorMittal Liege Res, B-4000 Liege, Belgium

[2] Univ Libre Bruxelles, Fac Sci Chim, Unite ULB 110, B-1050 Brussels, Belgium

来源：

APPLIED SURFACE SCIENCE | 2009年 / 256卷 / 03期

关键词：

PECVD; Sputtering; Copper; HMDSO; Steel; Antibacterial; ANTIBACTERIAL PROPERTIES; ANTIMICROBIAL ACTIVITY; PLASMA POLYMERIZATION; MECHANICAL-PROPERTIES; POTENTIAL USE; COATINGS; SILVER; POLYETHYLENE; COMPOSITES;

D O I：

10.1016/j.apsusc.2009.04.195

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A low frequency plasma process is used to deposit thin films on steel through simultaneous sputtering and plasma enhanced chemical vapour deposition (PECVD). The deposited material consists in composite copper-organosilicon thin layers where copper is obtained by magnetron sputtering whereas the organosilicon plasma polymer is grown by PECVD from HMDSO (hexamethyldisiloxane). This paper focuses on the important process parameters required to control the quantity of incorporated copper in the layer, particularly the metalorganic concentration and the sputtering current. The dispersion of copper vs. the thin film thickness is found to be homogeneous. The deposited layers show antimicrobial activity for copper contents higher than X = 38%, where X = [Cu]/([Cu] + [Si]). (C) 2009 Elsevier B. V. All rights reserved.

引用

页码：S82 / S85

页数：4

共 24 条

[1] Potential use of copper as a hygienic surface; problems associated with cumulative soiling and cleaning
Airey, P.
Verran, J.
[J]. JOURNAL OF HOSPITAL INFECTION, 2007, 67 (03) : 271 - 277
[2] Synthesis of DLC films by PECVD combined with hollow cathode sputtering
Anita, V.
Butsuda, T.
Saito, N.
Takai, O.
[J]. VACUUM, 2006, 80 (07) : 736 - 739
[3] [Anonymous], 1992, Handbook of X-Ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data 1992
[4] A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor
Aumaille, K
Vallée, C
Granier, A
Goullet, A
Gaboriau, F
Turban, G
[J]. THIN SOLID FILMS, 2000, 359 (02) : 188 - 196
[5] Microstructure and antibacterial properties of AISI 420 stainless steel implanted by copper ions
Dan, ZG
Ni, HW
Xu, BF
Xiong, J
Xiong, PY
[J]. THIN SOLID FILMS, 2005, 492 (1-2) : 93 - 100
[6] Description of a hybrid PECVD-PVD-process: Application to Zn-Si-O and Ti-Si-O composites thin films
Daniel, A.
Duguet, T.
Belmonte, T.
[J]. APPLIED SURFACE SCIENCE, 2007, 253 (24) : 9323 - 9329
[7] SYNTHESIS OF GOLD CARBON COMPOSITES BY SIMULTANEOUS SPUTTERING AND PLASMA POLYMERIZATION OF PROPANE IN RF CAPACITIVELY COUPLED DIODE SYSTEM (13.56 MHZ)
DESPAX, B
FLOUTTARD, JL
[J]. THIN SOLID FILMS, 1989, 168 (01) : 81 - 88
[8] Deposition of "polysiloxane" thin films containing silver particles by an RF asymmetrical discharge
Despax, Bernard
Raynaud, Patrice
[J]. PLASMA PROCESSES AND POLYMERS, 2007, 4 (02) : 127 - 134
[9] Chromium in amorphous hydrogenated carbon based thin films prepared in a PACVD process
Gantenbein, P
Brunold, S
Frei, U
Geng, J
Schüler, A
Oelhafen, P
[J]. CARBON, 1999, 37 (05) : 843 - 846
[10] OES and FTIR diagnostics of HMDSO/O2 gas mixtures for SiOx deposition assisted by RF plasma
Goujon, M
Belmonte, I
Henrion, G
[J]. SURFACE & COATINGS TECHNOLOGY, 2004, 188 (1-3 SPEC.ISS.) : 756 - 761

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