Effect of Substrate Temperature on Fluorine Doped Tin Oxide Thin films (FTO) by Chemical Spray Pyrolysis Method

被引：3

作者：

Eqbal, Ebitha ^{[1
]}

Anila, E., I ^{[1
]}

机构：

[1] Union Christian Coll, Dept Phys, Optoelect & Nanomat Res Lab, Aluva 683102, Kerala, India

来源：

3RD INTERNATIONAL CONFERENCE ON OPTOELECTRONIC AND NANO MATERIALS FOR ADVANCED TECHNOLOGY (ICONMAT 2019) | 2019年 / 2082卷

关键词：

D O I：

10.1063/1.5093831

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Fluorine doped tin oxide (FTO) thin films were prepared by chemical spray pyrolysis method on glass substrates for different substrate temperatures and their structural, optical and electrical studies were investigated. X-ray diffraction (XRD) study showed polycrystalline nature of the films with mixed phase of both tetragonal and orthorhombic structures of tin oxide. The grain size (D) of the thin films calculated using Scherrer's formula and W-H plot are in the range 13 nm to 21 nm. The FESEM images revealed that the films have smooth and homogeneous surface morphology with thin granular grains distributed throughout the surface. The sample synthesized at 420 degrees C has maximum values for transmission percentage in the visible region, conductivity and mobility of 95%, 631.6 Siemens /cm and 4.54 cm(2)V(-1)s(-1) respectively.

引用

页数：4

共 7 条

[1] TIN OXIDE MICROSENSOR FOR LPG MONITORING [J].

CHUNG, WY ;

SHIM, CH ;

CHOI, SD ;

LEE, DD .

SENSORS AND ACTUATORS B-CHEMICAL, 1994, 20 (2-3) :139-143

[2] Studies on micro-structural and electrical properties of spray-deposited fluorine-doped tin oxide thin films from low-cost precursor [J].

Elangovan, E ;

Ramamurthi, K .

THIN SOLID FILMS, 2005, 476 (02) :231-236

[3] Properties of transparent conducting tin monoxide(SnO) thin films prepared by chemical spray pyrolysis method [J].

Eqbal, Ebitha ;

Anila, E. I. .

PHYSICA B-CONDENSED MATTER, 2018, 528 :60-65

[4] Transparent conducting F-doped SnO2 thin films grown by pulsed laser deposition [J].

Kim, H. ;

Auyeung, R. C. Y. ;

Pique, A. .

THIN SOLID FILMS, 2008, 516 (15) :5052-5056

[5] Fluorine-doped tin oxide films grown by pulsed direct current magnetron sputtering with an Sn target [J].

Liao, Bo-Huei ;

Kuo, Chien-Cheng ;

Chen, Pin-Jen ;

Lee, Cheng-Chung .

APPLIED OPTICS, 2011, 50 (09) :C106-C110

[6] FLUORINE-DOPED TIN DIOXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION [J].

MARUYAMA, T ;

TABATA, K .

JOURNAL OF APPLIED PHYSICS, 1990, 68 (08) :4282-4285

[7] Structural, electrical and optical properties of SnO2-x:F-layers deposited by DC-reactive magnetron-sputtering from a metallic target in Ar-O2/CF4 mixtures [J].

Mientus, R ;

Ellmer, K .

SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3) :1267-1271

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