Study of microstructural evolutions in phosphorus-doped ZnO films grown by pulsed laser deposition

被引:14
作者
Jang, J. H. [1 ]
Kim, H. S. [2 ]
Norton, D. P. [1 ]
Craciun, V. [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
关键词
Characterization; X-ray diffraction; Pulsed laser deposition; Semiconducting II-IV materials; P-TYPE ZNO; MOLECULAR-BEAM EPITAXY; THIN-FILMS; ROOM-TEMPERATURE; SAPPHIRE; GAN; EMISSION; DEVICES; LAYERS;
D O I
10.1016/j.jcrysgro.2009.03.019
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The microstructure of P-doped ZnO films grown on the c-plane sapphire substrate by pulsed laser deposition (PLD) was investigated. ZnO films were highly textured along c-axis with two different in-plane orientations. The textured domain was surrounded by the threading dislocations, resulting in the formation of low-angle grain boundary. It was found that the degree of texture and crystalline quality of P-doped ZnO films decreased with increasing the phosphorus atomic percent. For the microstrain study, X-ray diffraction line profile analysis (LPA) was performed. The 0.5 at% P-doped ZnO film showed much higher microstrain than the 1.0 at% P-doped ZnO film as well as as-grown film, which indicated that the phosphorus in former film was effectively incorporated into ZnO film. X-ray photoelectron spectroscopy (XPS) results showed that the phosphorus in 1.0 at% P-doped ZnO film tended towards segregation, which was well consistent with XRD results. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:3143 / 3146
页数:4
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