High-Performance All 2D-Layered Tin Disulfide: Graphene Photodetecting Transistors with Thickness-Controlled Interface Dynamics

被引:37
作者
Chang, Ren-Jie [1 ]
Tan, Haijie [1 ]
Wang, Xiaochen [1 ]
Porter, Benjamin [1 ]
Chen, Tongxin [1 ]
Sheng, Yuewen [1 ]
Zhou, Yingqiu [1 ]
Huang, Hefu [1 ]
Bhaskaran, Harish [1 ]
Warner, Jamie H. [1 ]
机构
[1] Univ Oxford, Dept Mat, Parks Rd, Oxford OX1 3PH, England
基金
欧洲研究理事会; 英国工程与自然科学研究理事会;
关键词
SnS2; graphene; photodetectors; transistors; vertical-layered heterostructures; 2D; TMDs; Schottky barrier height; CHEMICAL-VAPOR-DEPOSITION; 2-DIMENSIONAL SNS2; LAYER MOS2; GROWTH; GAIN; 2D; CRYSTALS; WS2;
D O I
10.1021/acsami.8b01038
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tin disulfide crystals with layered two-dimensional (2D) sheets are grown by chemical vapor deposition using a novel precursor approach and integrated into all 2D transistors with graphene (Gr) electrodes. The Gr:SnS2:Gr transistors exhibit excellent photodetector response with high detectivity and photoresponsivity. We show that the response of the all 2D photodetectors depends upon charge trapping at the interface and the Schottky barrier modulation. The thickness-dependent SnS2 measurements in devices reveal a transition from the interface dominated response for thin crystals to bulklike response for the thicker SnS2 crystals, showing the sensitivity of devices fabricated using layered materials on the number of layers. These results show that SnS2 has photosensing performance when combined with Gr electrodes that is comparable to other 2D transition metal dichalcogenides of MoS2 and WS2.
引用
收藏
页码:13002 / 13010
页数:9
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