RF PERFORMANCE ASSESSMENT OF AlGaN/GaN MISHFET AT HIGH TEMPERATURES FOR IMPROVED POWER AND PINCH-OFF CHARACTERISTICS

被引:10
作者
Aggarwal, Ruchika [1 ]
Agrawal, Anju [2 ]
Gupta, Mridula [1 ]
Gupta, R. S. [1 ]
机构
[1] Univ Delhi, Dept Elect Sci, Semicond Devices Res Lab, New Delhi 110021, India
[2] Univ Delhi, Dept Elect, Acharya Narendra Dev Coll, New Delhi 110019, India
关键词
AlGaN/GaN MISHFET; carrier mobility; cut-off-frequency; high temperature; pinch-off characteristics; saturation velocity; saturation output power; FIELD-EFFECT-TRANSISTORS; PIEZOELECTRIC POLARIZATION; MICROWAVE; HFETS; OXIDE; GAN; HETEROSTRUCTURES; DEPENDENCE;
D O I
10.1002/mop.24461
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An investigation of temperature model for an AlGaN/GaN MISHFET is presented and a relative comparison is done with conventional HFET structures. The proposed analytical model demonstrates its inherent ability to operate at higher temperature. The contributions from various temperature dependent material parameters are taken into account along with the effect of temperature on the sheet carrier concentration and threshold voltage of the device. The model is further extended to predict the temperature dependence of transconductance, cat off frequency and pinch-off characteristics. The investigated temperature range is from 25 degrees C-300 degrees C Non linear Fermi potential (E-f) variation with the sheet carrier concentration (n(s)), and the highly dominant effects of spontaneous and piezoelectric polarization at the AlGaN/GaN heterointerface are also considered. AlGaN/GaN MISHFETs demonstrate larger drain currents, cut-off frequency, and better pinch-off characteristics at high temperatures. The model is based on closed from expression and does not involve elaborate computation. The analytical results on the transport characteristics of both the devices are compared with available experimental data and are in good agreement. (C) 2009 Wiley Periodicals. Inc. Microwave Opt Technol Lett 51: 1942-1949, 2009: Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.24461
引用
收藏
页码:1942 / 1949
页数:8
相关论文
共 28 条
  • [1] Submicron gate Si3N4/AlGaN/GaN-metal-insulator-semiconductor heterostructure field-effect transistors
    Adivarahan, V
    Gaevski, M
    Sun, WH
    Fatima, H
    Koudymov, A
    Saygi, S
    Simin, G
    Yang, J
    Khan, MA
    Tarakji, A
    Shur, MS
    Gaska, R
    [J]. IEEE ELECTRON DEVICE LETTERS, 2003, 24 (09) : 541 - 543
  • [2] Gate dielectric engineering of quarter sub micron AlGaN/GaN MISHFET: A new device architecture for improved transconductance and high cut-off frequency
    Aggarwal, Ruchika
    Agrawal, Anju
    Gupta, Mridula
    Gupta, R. S.
    [J]. SOLID-STATE ELECTRONICS, 2008, 52 (10) : 1610 - 1614
  • [3] Analytical performance evaluation of AlGaN/GaN metal insulator semiconductor heterostructure field effect transistor and its comparison with conventional hfets for high power microwave applications
    Aggarwal, Ruchika
    Agrawal, Anju
    Gupta, Mridula
    Gupta, R. S.
    [J]. MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, 2008, 50 (02) : 331 - 338
  • [4] Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures
    Ambacher, O
    Smart, J
    Shealy, JR
    Weimann, NG
    Chu, K
    Murphy, M
    Schaff, WJ
    Eastman, LF
    Dimitrov, R
    Wittmer, L
    Stutzmann, M
    Rieger, W
    Hilsenbeck, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) : 3222 - 3233
  • [5] Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures
    Ambacher, O
    Foutz, B
    Smart, J
    Shealy, JR
    Weimann, NG
    Chu, K
    Murphy, M
    Sierakowski, AJ
    Schaff, WJ
    Eastman, LF
    Dimitrov, R
    Mitchell, A
    Stutzmann, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (01) : 334 - 344
  • [6] [Anonymous], [No title captured]
  • [7] Bunea GE, 1999, MRS INTERNET J N S R, V4
  • [8] BURN J, 1997, IEEE ELECTR DEVICE L, V18, P141
  • [9] Photo-CVD SiO2 layers on AlGaN and AlGaN-GaN MOSHFET
    Chiou, YZ
    Chang, SJ
    Su, YK
    Wang, CK
    Lin, TK
    Huang, BR
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (08) : 1748 - 1752
  • [10] AlGaN/GaN metal oxide semiconductor heterostructure field-effect transistor based on a liquid phase deposited oxide
    Chou, DW
    Lee, KW
    Huang, JJ
    Wu, HR
    Wang, YH
    Houng, MP
    Chang, SJ
    Su, YK
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (7A): : L748 - L750