Third harmonic generation in ultrathin epsilon-near-zero media

被引：0

作者：

Luk, Ting S. ^{[1
,2
]}

de Ceglia, Domenico ^{[3
]}

Keeler, Gordon A. ^{[1
]}

Prasankumar, Rohit P. ^{[1
,4
]}

Vincenti, Maria A. ^{[3
]}

Liu, Sheng ^{[1
,2
]}

Scalora, Michael ^{[5
]}

Sinclair, Michael B. ^{[1
]}

Campione, Salvatore ^{[1
,2
]}

机构：

[1] Sandia Natl Labs, POB 5800, Albuquerque, NM 87185 USA

[2] Sandia Natl Labs, Ctr Integrated Nanotechnol CINT SNL, Albuquerque, NM 87185 USA

[3] Natl Res Council AMRDEC, Charles M Bowden Res Lab, Redstone Arsenal, AL 35898 USA

[4] Los Alamos Labs, Ctr Integrated Nanotechnol CINT LANL, Los Alamos, NM 87545 USA

[5] US Army RDECOM, Charles M Bowden Res Lab, AMRDEC, Redstone Arsenal, AL 35898 USA

来源：

2015 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2015年

关键词：

WAVE-GUIDES;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate efficient third harmonic generation from a 21.6nm-thick indium tin oxide film on glass substrate for a pump fundamental wavelength of 1350nm using the field enhancement properties of optical modes supported by epsilon-near-zero media.

引用

页数：2

共 6 条

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