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Self-Assembled Monolayers of Alkanethioacetates on Au(111) in Ammonium Hydroxide Solution
被引:3
作者:
Park, Taesung
[1
]
Kang, Hungu
[1
]
Ito, Eisuke
[2
]
Noh, Jaegeun
[1
,3
,4
]
机构:
[1] Hanyang Univ, Dept Chem, Seoul 04763, South Korea
[2] Chem Mat Evaluat & Res Base CEREBA, Higashi 1-1-1,AIST Cent 5-2, Tsukuba, Ibaraki 3058565, Japan
[3] Hanyang Univ, Inst Nano Sci & Technol, Seoul 04763, South Korea
[4] Hanyang Univ, Res Inst Convergence Basic Sci, Seoul 04763, South Korea
基金:
新加坡国家研究基金会;
关键词:
Self‐
assembled monolayers;
Alkanethioacetate;
Adsorption;
Scanning tunneling microscopy;
X‐
ray photoelectron spectroscopy;
MOLECULAR WIRES;
CONJUGATED THIOLS;
DIRECT ADSORPTION;
GOLD;
PHASE;
THIOACETATE;
SOLVENT;
DEPROTECTION;
CONDUCTANCE;
OCTANETHIOL;
D O I:
10.1002/bkcs.12189
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
To shed light on the effects of NH4OH deprotection reagent on the formation of self-assembled monolayers (SAMs) from alkanethioacetates on Au(111), we examined the surface structure and adsorption conditions of SAMs on Au(111) prepared in a 1 mM octanethioacetate (C8SAc) methanol solution and in a 1 mM methanol solution formed after in situ deprotection of C8SAc by NH4OH. Scanning tunneling microscopy (STM) imaging revealed that direct adsorption of C8SAc on Au(111) created only disordered SAMs regardless of the polarity of solvent (methanol, DMF, and hexane). In contrast, highly ordered SAMs with a well-ordered c(4 x 2) phase were formed via in situ deprotection of C8SAc by NH4OH (deprotection condition: 30.7 mM NH4OH, 323 K, and 3 h). X-ray photoelectron spectroscopy measurements also showed that the SAMs formed via in situ deprotection show uniform adsorption, whereas those prepared by direct adsorption show very complicated adsorption, which agrees well with STM results.
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页码:252 / 257
页数:6
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