APM lithography on Langmuir-Blodgett film of octadecyltrichlorosilane

被引：2

作者：

She, J ^{[1
]}

Song, JQ ^{[1
]}

Wang, YC ^{[1
]}

Liu, ZF ^{[1
]}

机构：

[1] Peking Univ, Coll Chem & Mol Engn, Ctr Nanoscale Sci & Technol, Beijing 100871, Peoples R China

来源：

MOLECULAR CRYSTALS AND LIQUID CRYSTALS SCIENCE AND TECHNOLOGY SECTION A-MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 1999年 / 337卷

基金：

中国国家自然科学基金;

关键词：

AFM; nanolithography; OTS; LB film;

D O I：

10.1080/10587259908023440

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Octadecyltrichlorosilane (OTS) Langmuir-Blodgett (LB) film was used as a resist layer for nanofabrication with AFM tips. Features with linewidth of 30nm have been achieved. Threshold forces for lithography were found to be 400nN for OTS monolayer and 800nN for mica substrate respectively. The OTS film is shown to have nice mechanical stability and wearability for AFM lithography.

引用

页码：313 / 316

页数：4

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