ZnO2/ZnO bilayer switching film for making fully transparent analog memristor devices

被引:45
|
作者
Simanjuntak, Firman Mangasa [1 ]
Chandrasekaran, Sridhar [2 ]
Lin, Chun-Chieh [1 ]
Tseng, Tseung-Yuen [3 ]
机构
[1] Natl Dong Hwa Univ, Dept Elect Engn, Hualien 97401, Taiwan
[2] Natl Chiao Tung Univ, Dept Elect Engn & Comp Sci, Hsinchu 30010, Taiwan
[3] Natl Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan
来源
APL MATERIALS | 2019年 / 7卷 / 05期
关键词
MEMORIES;
D O I
10.1063/1.5092991
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Hydrogen peroxide treatment induces the phase transformation of hexagonal ZnO to cubic ZnO2 on the surface of the ZnO switching memory film; this oxidation process effectively reduces the concentration of n-type donor defects (oxygen vacancies and zinc interstitials) in the switching film. The chemically oxidized ZnO2 layer not only lowers the operation current of the device but also can serve as an oxygen bank to improve the endurance of the memristor. The oxidation reaction of peroxide treatment can be easily controlled to achieve an analog behavior with good switching uniformity. The analog memristor device is able to perform two-bit per cell and synaptic operations. Based on the experimental synaptic data, an image processing of 7 x 9 pixels using a simulated artificial neural network comprises 63 synapses is evaluated to mimic the visual cortex function of the brain.
引用
收藏
页数:7
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