Alloying effects on ductility of nanostructured Cu-X (X = Zr and W) thin films

被引:8
作者
Zhao, J. T. [1 ]
Zhang, J. Y. [1 ]
Yuan, H. Z. [1 ]
Wu, K. [1 ]
Liu, G. [1 ]
Sun, J. [1 ]
机构
[1] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi, Peoples R China
基金
中国博士后科学基金; 中国国家自然科学基金;
关键词
Nanocrystalline metal; Columnar grains; Cu-Zr and Cu-W films; Grain boundary segregation; Ductility; TWIN THICKNESS; GRAIN-BOUNDARY; EMBRITTLEMENT; STRENGTH; NUCLEATION; PLASTICITY; STABILITY; BEHAVIOR; METALS;
D O I
10.1016/j.scriptamat.2018.04.027
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Alloying effect on tensile ductility of nanostructured Cu-X (X = Zr and W) thin films was studied in comparison. Both Zr and W atoms segregated at grain boundaries (GBs) and increased the GB cohesion energy, leading to similar increase of ductility in as-deposited Cu-X films. After annealing treatment, however, changes in ductility showed different alloying effect: the Cu-Zr one increased while the Cu-W one decreased when compared with their as-deposited counterparts. This discrepancy was rationalized by different microstructural evolution that intergranular CuZr amorphous layer was produced in the Cu-Zr film while intergranular W grains were formed in the Cu-W one. (C) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:146 / 149
页数:4
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