Fabrication of Tl2Ba2CaCu2O8 superconducting films without thallium pellets

被引:4
作者
Xu, Teng-Da [1 ]
Xing, Jian [1 ]
Wang, Li-Tian [1 ]
Zhang, Jin-Li [1 ]
Zhao, Sheng-Hui [1 ]
Xiong, Yang [1 ]
Zhao, Xin-Jie [1 ,2 ]
Ji, Lu [1 ,2 ]
Zhang, Xu [1 ]
He, Ming [1 ]
机构
[1] Nankai Univ, Coll Elect Informat & Opt Engn, Tianjin 300350, Peoples R China
[2] Key Lab Photoelect Thin Film Devices & Technol Ti, Tianjin 300350, Peoples R China
基金
中国国家自然科学基金;
关键词
Tl-2212 superconducting films; post-annealing; critical temperature; critical current density; O THIN-FILMS; PULSED-LASER EVAPORATION; LOW-TEMPERATURE; MICROWAVE; PRESSURE; SYSTEM; GROWTH;
D O I
10.1088/1674-1056/27/5/057403
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A new improved two-step method in fabricating Tl2Ba2CaCu2O8 (Tl-2212) thin films is presented in this paper. In the first process of dc magnetron sputtering, the thallium content in the precursor film is largely increased by adjusting the ratio of thallium in the sputtering targets. After the second annealing process in the absence of additional thallium pellets or powder source, high-quality Tl-2212 thin films can be obtained. The proper content of thallium in the precursor film provides a relatively stable atmosphere to guarantee the growth of Tl-2212 film. This method avoids the repeated production of the thallium pellets in the post-annealing process, the repeatability and controllability of the experiment are greatly improved. X-ray diffraction (XRD) scans show that all of the sharp peaks of the sample films can be assigned to the (00l) peaks of Tl-2212 phase. The highest superconducting critical temperature (T-c) of the films is 105 K and the critical current density (J(c)) can achieve 1.93 MA/cm(2) in zero magnetic field at 77 K for a 600 nm film.
引用
收藏
页数:5
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