Influence of ITO Electrode Surface Composition on the Growth and Optoelectronic Properties of Electrodeposited Cu2O Thin Films

被引:11
|
作者
Osherov, Anna [1 ]
Zhu, Changqiong [1 ]
Panzer, Matthew J. [1 ]
机构
[1] Tufts Univ, Dept Chem & Biol Engn, Medford, MA 02155 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2013年 / 117卷 / 47期
基金
美国国家科学基金会;
关键词
RAY PHOTOELECTRON-SPECTROSCOPY; TIN OXIDE-FILMS; INDIUM-TIN; WORK-FUNCTION; OPTICAL-PROPERTIES; DEPOSITION; TRANSPARENT; MORPHOLOGY;
D O I
10.1021/jp409192p
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Morphological inhomogeneity between electrodeposited cuprous oxide (Cu2O) thin films on nominally equivalent tin-doped indium oxide (ITO) electrodes under identical deposition conditions is reported. Dependence of the Cu2O photocurrent generation ability on thin-film morphology is also described. Films exhibiting compact, polyhedral crystallites produce short circuit photocurrents more than 10 times greater than those consisting of sparse, dendritic crystallites. A correlation between the ITO surface stoichiometry and the resulting Cu2O film morphology is established using X-ray photoelectron spectroscopy for identification of the ITO electrode surface chemical states. Variation in the Sn/In atomic ratio up to 33% is measured at the surfaces of ITO substrates from the same supplier lot, highlighting the importance of thorough electrode characterization prior to electrodeposition to obtain repeatable Cu2O performance for energy conversion applications.
引用
收藏
页码:24937 / 24942
页数:6
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