Reactively magnetron sputtered Ti-Al-N thin films with enhanced mechanical properties

被引：4
作者：
Kourtev, J [1 ]
Pascova, R [1 ]
机构：
[1] INST PHYS CHEM,SOFIA 1113,BULGARIA
来源：
VACUUM | 1996年 / 47卷 / 10期
关键词：
D O I：
10.1016/0042-207X(96)00195-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A simplified technology for reactive magnetron sputtering of Ti-Al-N coatings with improved mechanical properties is proposed. This technology is based on the known method for adhesion enhancement by depositing interlayers with graded composition. In the present contribution the adhesion of Ti-Al-N coatings on HSS substrates was significantly improved by consecutive deposition of two interlayers, the first one with constant composition nearly equal to that of the target used (Ti:Al = 75:25 at%) and the second one with graded composition through the thickness of the interlayer. The thicknesses of these interlayers are about 3% and 10% of the overall thickness of the coating, respectively. The coatings thus deposited are characterized with microhardness and adhesion comparable to those of the best Ti-Al-N films reported so far. The technology proposed in the present study could find a wide practical application for deposition of high qualify wear-resistant Ti-Al-N coatings on HSS tools. Copyright (C) 1995 Elsevier Science Ltd
引用
收藏
页码：1197 / 1201
页数：5
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