Numerical Analysis of Pattern Shape Deformation in UV Imprint Due to Curing Shrinkage

被引：0

作者：

Onishi, Yuki ^{[1
]}

Yamashita, Ryunosuke ^{[1
]}

Amaya, Kenji ^{[1
]}

Hirai, Yoshihiko ^{[2
]}

机构：

[1] Tokyo Inst Technol, Sch Engn, Dept Syst & Control Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528550, Japan

[2] Osaka Prefecture Univ, Grad Sch Engn, Dept Phys & Elect, Naka Ku, 1-1 Gakuen Cho, Osaka, Osaka 5998531, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2020年 / 33卷 / 02期

关键词：

UV imprint; UV curing; UV shrinkage; Thermo-viscoelastic material; Virtual temperature; Finite element analysis; POLYMER DEFORMATION; NANOIMPRINT; SIMULATION;

D O I：

10.2494/photopolymer.33.245

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The accuracy of a numerical modeling method for UV imprint processes to simulate the UV resin deformation due to UV shrinkage was evaluated. Typical UV resins induce volumetric shrinkage by several percent after UV curing. The curing shrinkage deforms the pattern shape and could be a significant issue in UV imprint for high -precision pattern moldings such as optical device patterning. Taking notice of the analogy between UV imprint and thermal imprint, the modeling method introduces the idea of "virtual temperature" to express the UV reaction progress. Accordingly, the curing/shrinkage of UV resin can be treated as the solidification/contraction of thermo-plastic resin modeled as a thermo-viscoelastic material. A validation analysis for a micromirror array patterning with the shift in the demolding time reveals that the modeling method can qualitatively predict the final shape of surface curves varied with the demolding time.

引用

页码：245 / 250

页数：6

共 21 条

[1] Polymerization shrinkage stress measurement for a UV-curable resist in nanoimprint lithography [J].