Plasma needle: a non-destructive atmospheric plasma source for fine surface treatment of (bio)materials

被引:525
作者
Stoffels, E [1 ]
Flikweert, AJ [1 ]
Stoffels, WW [1 ]
Kroesen, GMW [1 ]
机构
[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands
关键词
D O I
10.1088/0963-0252/11/4/304
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A non-thermal plasma source ('plasma needle') generated under atmospheric pressure by means of radio-frequency excitation has been characterized. Plasma appears as a small (sub-mm) glow at the tip of a metal pin. It operates in helium. argon, nitrogen and mixtures of He with air. Electrical measurements show that plasma needle operates at relatively low voltages (200-500 V peak-to-peak) and the power consumption ranges from tens of milliwatts to at most a few watts. Electron-excitation, vibrational and rotational temperatures have been determined using optical emission spectroscopy. Excitation and vibration temperatures are close to each other, in the range 0.2-0.3 eV, rotational gas temperature is at most a few hundred K. At lowest power input the source has the highest excitation temperature while the gas remains at room temperature. We have demonstrated the non-aggressive nature of the plasma: it can be applied on organic materials, also in watery environment, without causing thermal/electric damage to the surface. Plasma needle will be used in the study of plasma interactions with living cells and tissues. At later stages., this research aims at performing fine, high-precision plasma surgery, like removal of (cancer) cells or cleaning of dental cavities.
引用
收藏
页码:383 / 388
页数:6
相关论文
共 23 条
  • [1] [Anonymous], 1969, ELECT IONIC IMPACT P
  • [2] FRANCK-CONDON FACTORS, R-CENTROIDS, ELECTRONIC-TRANSITION MOMENTS, AND EINSTEIN COEFFICIENTS FOR MANY NITROGEN AND OXYGEN BAND SYSTEMS
    GILMORE, FR
    LAHER, RR
    ESPY, PJ
    [J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (05) : 1005 - 1107
  • [3] Griem HR., 1964, Plasma Spectroscopy
  • [4] Haag R, 1993, J R Coll Surg Edinb, V38, P354
  • [5] Modeling of the microdischarges in plasma addressed liquid crystal displays
    Hagelaar, GJM
    Kroesen, GMW
    van Slooten, U
    Schreuders, H
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (05) : 2252 - 2262
  • [6] HERZBERG G, 1955, MOL SPECTRA MOL STRU, V1
  • [7] The degradation of aqueous phenol solutions by pulsed positive corona discharges
    Hoeben, WFLM
    van Veldhuizen, EM
    Rutgers, WR
    Cramers, CAMG
    Kroesen, GMW
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (03) : 361 - 369
  • [8] RADIO-FREQUENCY SPUTTERING - THE SIGNIFICANCE OF POWER INPUT
    HORWITZ, CM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (04): : 1795 - 1800
  • [9] Diagnostics and application of the high frequency plasma pencil
    Janca, J
    Zajícková, L
    Klíma, M
    Slavícek, P
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 2001, 21 (04) : 565 - 579
  • [10] TIME-AVERAGED ELECTRIC-POTENTIAL PROFILES IN A CAPACITIVE-COUPLING PARALLEL-PLATE ELECTRODE NEON GAS RF DISCHARGE PLASMA
    KANEDA, T
    KUBOTA, T
    OHUCHI, M
    CHANG, JS
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1990, 23 (12) : 1642 - 1647