Self-assembling resists based on block copolymers.

被引：0
|
作者：
Nealey, PF [1 ]
机构：
[1] Univ Wisconsin, Dept Chem Engn, Madison, WI 53706 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 227卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
19-PMSE
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页码：U472 / U472
页数：1
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