Behavior of copper in acidic sulfate solution: Comparison with acidic chloride

被引:44
作者
Tromans, D
Silva, JC
机构
[1] Dept. of Met. and Mat. Engineering, University of British Columbia, Vancouver, BC V6T 1Z4
[2] Departmento de Ingenieria Quimica, Universidad de Carabobo, Valencia
关键词
anodic polarization; charge transfer; copper; cupric ions; cuprous complexes; diffusion layer; electrowinning; limiting current; mass transfer; mass transport; pH; potential; sodium sulfate; sulfuric acid; Tafel slope;
D O I
10.5006/1.3280457
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The anodic polarization behavior of copper in a 0.1 M sulfuric acid (H2SO4) + 1 M sodium sulfate (Na2SO4) solution (pH = 2.0) was studied at room temperature under quiescent and stirred conditions, The behavior was compared with aqueous equilibria via construction of a potential-vs-pH (E-pH) diagram for the copper-sulfate-water (Cu-SO42--H2O) system Interpretation of the behavior was aided by comparison with aqueous equilibria and polarization studies of copper in a 0.2 M hydrochloric acid (HCl) + 1 M sodium chloride (NaCl) solution (pH = 0.8). The initial anodic dissolution region in the acidic sulfate solution exhibited Tafel behavior with a slope consistent with formation of cupric ions (Cu2+) whose rate of formation was charge-transfer controlled. At higher potentials, limiting current density (i(L)) behavior was observed under E-pH conditions that were consistent with formation of a film of copper sulfate pentahydrate (CuSO4 . 5H(2)O). Comparison of experimental i(L) values with those predicted by mass transport-controlled processes, using estimates of the diffusion layer thickness obtained from the mass transfer-influenced region of apparent Tafel behavior in the acidic chloride solution, were in sufficient agreement to indicate i(L) was controlled by the rate of dissolution of the CuSO4 . 5H(2)O film via transport of Cu2+ from the film-electrolyte interface into the bulk solution.
引用
收藏
页码:171 / 178
页数:8
相关论文
共 50 条
  • [21] Channel flow double electrode study on electrochemical oscillation during copper dissolution in acidic chloride solution
    Itagaki, M
    Mori, T
    Watanabe, K
    CORROSION SCIENCE, 1999, 41 (10) : 1955 - 1970
  • [22] The influence of the copper/nickel ratio on the electrochemical behavior of Cu-Ni alloys in acidic sulfate solutions
    Badawy, Waheed A.
    Ismail, Khaled M.
    Fathi, Ahlam M.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 484 (1-2) : 365 - 370
  • [23] INFLUENCE OF GELATINE ON CORROSION BEHAVIOR OF COPPER IN ACIDIC MEDIA
    Todorovic, Dragisa A.
    Milenkovic, Dragan D.
    Milosavljevic, Milutin M.
    Markovic, Dragan A.
    HEMIJSKA INDUSTRIJA, 2012, 66 (02) : 193 - 200
  • [24] Effect of Seawater on the Solubility and Physicochemical Properties of Acidic Copper Sulfate Solutions
    Hernandez, Pia C.
    Galleguillos, Hector R.
    Graber, Teofilo A.
    Flores, Elsa K.
    Taboada, Maria E.
    JOURNAL OF CHEMICAL AND ENGINEERING DATA, 2012, 57 (09) : 2430 - 2436
  • [25] Corrosion inhibition of copper by potassium ethyl xanthate in acidic chloride solutions
    Scendo, M
    CORROSION SCIENCE, 2005, 47 (11) : 2778 - 2791
  • [26] Solvent extraction of copper from acidic chloride solutions with LIX 84
    Elizalde, M. P.
    Rua, M. S.
    Menoyo, B.
    Ocio, A.
    HYDROMETALLURGY, 2019, 183 : 213 - 220
  • [27] Potassium ethyl xanthate as corrosion inhibitor for copper in acidic chloride solutions
    Scendo, M
    CORROSION SCIENCE, 2005, 47 (07) : 1738 - 1749
  • [28] Effect of pH on sacrificial anode aluminum alloy in acidic chloride solution
    Kawakami T.
    Yoshino M.
    Iwao S.
    Keikinzoku/Journal of Japan Institute of Light Metals, 2021, 71 (08): : 337 - 342
  • [29] Electrodeposition of copper from mixed sulphate-chloride acidic electrolytes at a rotating disc electrode
    Low, C. T. J.
    de Leon, C. Ponce
    Walsh, F. C.
    TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2014, 92 (05): : 282 - 288
  • [30] Spontaneous Reduction of Cupric Complex on Titanium Oxides in Acidic Sulfate-Chloride Media
    Liu, Jing
    Ren, Zihe
    Asselin, Edouard
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2017, 164 (02) : H37 - H41