Magnetotransport properties of Fe/GaAlAs/GaMnAs hybrid magnetic trilayer structures
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作者:
Yoo, Taehee
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Korea Univ, Dept Phys, Seoul 136701, South KoreaKorea Univ, Dept Phys, Seoul 136701, South Korea
Yoo, Taehee
[1
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Lee, Sanghoon
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Korea Univ, Dept Phys, Seoul 136701, South KoreaKorea Univ, Dept Phys, Seoul 136701, South Korea
Lee, Sanghoon
[1
]
Liu, Xinyu
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Univ Notre Dame, Dept Phys, South Bend, IN 46556 USAKorea Univ, Dept Phys, Seoul 136701, South Korea
Liu, Xinyu
[2
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Furdyna, Jacek K.
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Univ Notre Dame, Dept Phys, South Bend, IN 46556 USAKorea Univ, Dept Phys, Seoul 136701, South Korea
Furdyna, Jacek K.
[2
]
Lee, Dong Uk
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Hanyang Univ, Dept Phys, Seoul 133791, South Korea
Hanyang Univ, Res Inst Nat Sci, Seoul 133791, South KoreaKorea Univ, Dept Phys, Seoul 136701, South Korea
Lee, Dong Uk
[3
,4
]
Kim, Eun Kyu
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Hanyang Univ, Dept Phys, Seoul 133791, South Korea
Hanyang Univ, Res Inst Nat Sci, Seoul 133791, South KoreaKorea Univ, Dept Phys, Seoul 136701, South Korea
Kim, Eun Kyu
[3
,4
]
机构:
[1] Korea Univ, Dept Phys, Seoul 136701, South Korea
[2] Univ Notre Dame, Dept Phys, South Bend, IN 46556 USA
[3] Hanyang Univ, Dept Phys, Seoul 133791, South Korea
[4] Hanyang Univ, Res Inst Nat Sci, Seoul 133791, South Korea
We discuss tunneling magnetoresistance (TMR) phenomena observed in hybrid magnetic tunnel junctions (MTJs) fabricated from a Fe/GaAlAs/GaMnAs trilayer. The TMR clearly shows abrupt changes of resistance that depends on the relative alignments of magnetization in the two magnetic layers comprising the MTJ. The TMR ratio of the structure strongly depends on the bias voltage, reaching values up to similar to 45% when the bias voltage is low (similar to 0.2mV). In addition, the device exhibits intermediate TMR values, which correspond to non-collinear alignments of magnetization in the GaMnAs and the Fe layers. Such alignments are possible due to the presence of two magnetic easy axes both in both magnetic layers originating from their strong cubic magnetic anisotropy. The TMR states realized in such Fe/GaAlAs/GaMnAs MTJs are excellent candidates for use in multi-valued memory storage devices. (C) 2014 AIP Publishing LLC.
机构:
Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ikeda, S.
;
Hayakawa, J.
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Hitachi Ltd, Adv Res Lab, Kokubunji, Tokyo 1858601, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hayakawa, J.
;
Ashizawa, Y.
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Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ashizawa, Y.
;
Lee, Y. M.
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Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Lee, Y. M.
;
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Miura, K.
;
Hasegawa, H.
论文数: 0引用数: 0
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Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hitachi Ltd, Adv Res Lab, Kokubunji, Tokyo 1858601, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hasegawa, H.
;
Tsunoda, M.
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Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Tsunoda, M.
;
Matsukura, F.
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Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Matsukura, F.
;
Ohno, H.
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Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
机构:
Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ikeda, S.
;
Hayakawa, J.
论文数: 0引用数: 0
h-index: 0
机构:
Hitachi Ltd, Adv Res Lab, Kokubunji, Tokyo 1858601, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hayakawa, J.
;
Ashizawa, Y.
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h-index: 0
机构:
Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ashizawa, Y.
;
Lee, Y. M.
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Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Lee, Y. M.
;
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机构:
Miura, K.
;
Hasegawa, H.
论文数: 0引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hitachi Ltd, Adv Res Lab, Kokubunji, Tokyo 1858601, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hasegawa, H.
;
Tsunoda, M.
论文数: 0引用数: 0
h-index: 0
机构:
Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Tsunoda, M.
;
Matsukura, F.
论文数: 0引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan
Matsukura, F.
;
Ohno, H.
论文数: 0引用数: 0
h-index: 0
机构:
Tohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Lab Nanoelect & Spintron, Aoba Ku, Sendai, Miyagi 9808577, Japan