Real-space investigation of high-barrier hydrogen diffusion across the dimer rows of Si(001)

被引:5
作者
Schwalb, C. H. [1 ,2 ]
Duerr, M. [1 ,2 ,3 ]
Hoefer, U. [1 ,2 ]
机构
[1] Univ Marburg, Fachbereich Phys, D-35032 Marburg, Germany
[2] Univ Marburg, Zentrum Mat Wissensch, D-35032 Marburg, Germany
[3] Hsch Esslingen, Fak Angew Nat Wissensch, D-73728 Esslingen, Germany
关键词
elemental semiconductors; hydrogen; scanning tunnelling microscopy; silicon; surface diffusion; SCANNING-TUNNELING-MICROSCOPY; CHEMICAL-VAPOR-DEPOSITION; SI(100)-2X1 SURFACE; SILICON SURFACES; X; 7; DESORPTION; ADSORPTION; SI(111)-(7X7); COVERAGES; DYNAMICS;
D O I
10.1103/PhysRevB.80.085317
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hydrogen diffusion on Si(001) has been investigated on the atomic scale by means of a combination of laser-induced thermal heating and scanning tunneling microscopy. In addition to the well known diffusion path along the dimer rows, hydrogen diffusion across the rows was observed. At a surface temperature of 1385 K, the hopping rate of this high-barrier interrow diffusion pathway is 5.6x10(7) s(-1) comparable to the intrarow hopping rate of 1.3x10(8) s(-1). Thus, diffusion of hydrogen on Si(001), which is strongly anisotropic below 700 K, becomes almost isotropic at high temperatures.
引用
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页数:5
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