Fabrication of metallic nanostructures with an atomic force microscope

We describe a novel technique for fabricating metallic nanostructures on an arbitrary substrate using an atomic force microscope (AFM). An AFM tip is used to plow a pattern through a bilayer resist spun onto a substrate. A development step is then performed to create a mask through which metal can be evaporated. By changing the applied force, the top resist-layer thickness, or the development time, the linewidth can be varied. Continuous metallic wires 600 Angstrom x 400 A x Angstrom x 15 mu m have been routinely fabricated on bare substrates and between contact pads.