Topological materials by molecular beam epitaxy

被引:26
作者
Brahlek, Matthew [1 ]
Lapano, Jason [1 ]
Lee, Joon Sue [2 ]
机构
[1] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
关键词
DER-WAALS EPITAXY; BI2SE3; THIN-FILMS; ELECTRICAL DETECTION; PHASE-TRANSITION; INSULATOR BI2SE3; SURFACE-STATE; PRODUCTION TECHNOLOGY; MAJORANA FERMIONS; SPIN POLARIZATION; CRYSTAL-STRUCTURE;
D O I
10.1063/5.0022948
中图分类号
O59 [应用物理学];
学科分类号
摘要
Topology appears across condensed matter physics to describe a wide array of phenomena which could alter, augment, or fundamentally change the functionality of many technologies. Linking the basic science of topological materials to applications requires producing high-quality thin films. This will enable combining dissimilar materials while utilizing dimensionality, symmetry, and strain to create or control the electronic phase, as well as platforms to fabricate novel devices. Yet, one of the longstanding challenges in the field remains understanding and controlling the basic material properties of epitaxial thin films. The aim of this Perspective article is to discuss how understanding the fundamental properties of topological materials grown by molecular beam epitaxy (MBE) is key to deepening the knowledge of the basic physics, while developing a new generation of topological devices. A focus will be on the MBE growth of intrinsic materials, creation, and control of superconducting and magnetic topological phases. Addressing these questions in the coming decade will undoubtedly uncover many surprises as new materials are discovered and their growth as high-quality thin films is refined.
引用
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页数:28
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