Effect of DC Magnetron Sputtering Parameters on the Structure, Composition and Tribological Properties of Tantalum Diboride Films

被引：0
作者：
Pogrebnjak, A. D. [1 ]
Goncharov, A. A. [1 ]
Yunda, A. N. [1 ]
Shelest, I. V. [1 ]
Buranich, V. V. [1 ]
Konarski, P. [2 ]
Budzynski, P. [3 ]
机构：
[1] Sumy State Univ, Sumy, Ukraine
[2] Tele & Radio Res Inst, Warsaw, Poland
[3] Lublin Univ Technol, Lublin, Poland
来源：
PROCEEDINGS OF THE 2017 IEEE 7TH INTERNATIONAL CONFERENCE NANOMATERIALS: APPLICATION & PROPERTIES (NAP) | 2017年
关键词：
Tantalum diboride films; magnetron sputtering; structure; composition; friction coefficient; wear; THIN-FILMS; MECHANICAL-PROPERTIES; NANOCOMPOSITE COATINGS; N COATINGS; NANOCRYSTALLINE; HFB2;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Tantalum diboride films were deposited on stainless steel substrates using a direct current magnetron sputtering system under various sputtering conditions. X-ray diffraction analysis of the samples was carried out. Study of the coatings composition in depth was carried out using Rutherford backscattering and secondary ion mass spectrometry methods. The friction coefficient and wear of the coatings were determined by the "Pin-on-disk" method. The effect of deposition regimes on the structure, composition and tribological properties of the obtained coatings had been evaluated.
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