Infrared reflectance study of n-type GaSb epitaxial layers

被引:6
作者
Ferrini, R
Guizzetti, G
Patrini, M
Bosacchi, A
Franchi, S
Magnanini, R
机构
[1] CNR,INST MASPEC,I-43100 PARMA,ITALY
[2] UNIV PARMA,DIPARTIMENTO FIS,INFM,I-43100 PARMA,ITALY
关键词
semiconductors; impurities in semiconductors; optical properties;
D O I
10.1016/S0038-1098(97)00400-6
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Reflectance measurements from 50 to 5000 cm(-1) were made at room temperature on several GaSb layers grown by molecular beam epitaxy on GaAs substrates, and n-doped from similar to 10(16) to more than 10(18) cm(-3). A two-layer model, joined with Drude-Lorentz dielectric functions accounting for phonons and plasmons, was applied to calculate the reflectance spectra, which fitted the experimental data very well. With the optical parameters extracted it was possible to obtain the carrier concentration and mobility to be compared with the Hall measurements. Both the optical and transport analysis require a two-valley conduction model, because of the presence in GaSb of Gamma and L conduction valleys, separated by only 80 meV. Populations and free-carrier scattering times in each valley were derived as a function of the phenomenological plasma frequency. Some discrepancies between optical and transport results were found and are discussed. (C) 1997 Elsevier Science Ltd.
引用
收藏
页码:747 / 751
页数:5
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