Excitation and relaxation dynamics in dielectrics irradiated by an intense ultrashort laser pulse

被引:24
作者
Brouwer, Nils [1 ]
Rethfeld, Baerbel
机构
[1] Tech Univ Kaiserslautern, Dept Phys, Kaiserslautern, Germany
关键词
BAND-GAP MATERIALS; ELECTRONIC EXCITATION; PLASMAS; SEMICONDUCTORS; CRYSTALLINE; IONIZATION; BREAKDOWN; SOLIDS; METALS;
D O I
10.1364/JOSAB.31.000C28
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
When transparent dielectrics are irradiated by an intense, ultrashort laser pulse, the electron density in the conduction band is increased tremendously. Simultaneously, valence band states become unoccupied and the electron-phonon coupling strength is increased. In this paper, we present our work on modeling the ultrafast nonequilibrium dynamics of laser-excited transparent dielectrics with Boltzmann collision integrals. We track the distribution function of conduction and valence band electrons and discuss the effects of Auger recombination in relation to impact ionization and multiphoton/tunnel ionization on the femtosecond timescale. Finally, we investigate the electron-phonon coupling strength in highly excited dielectrics and calculate the electron-phonon coupling parameter for silicon dioxide-like material. (C) 2014 Optical Society of America
引用
收藏
页码:C28 / C35
页数:8
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