Asymmetric fused thiophenes for field-effect transistors: crystal structure-film microstructure-transistor performance correlations

被引:49
作者
Chen, Ming-Chou [1 ]
Vegiraju, Sureshraju [1 ]
Huang, Chi-Ming [1 ]
Huang, Peng-Yi [1 ]
Prabakaran, Kumaresan [1 ]
Yau, Shueh Lin [1 ]
Chen, Wei-Chih [2 ]
Peng, Wei-Tao [2 ]
Chao, Ito [1 ,2 ]
Kim, Choongik [3 ]
Tao, Yu-Tai [2 ]
机构
[1] Natl Cent Univ, Dept Chem, Chungli 32054, Taiwan
[2] Acad Sinica, Inst Chem, Taipei 115, Taiwan
[3] Sogang Univ, Dept Chem & Biomol Engn, Seoul 121742, South Korea
基金
新加坡国家研究基金会;
关键词
ORGANIC SEMICONDUCTORS; HIGH-MOBILITY; LARGE-AREA; POLYMER; CRYSTALLIZATION; DERIVATIVES; COPOLYMERS; STABILITY; TRANSPORT; ELECTRON;
D O I
10.1039/c4tc01454e
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
New asymmetric phenyl and perfluorophenyl end-functionalized dithienothiophene (DTT)- and bisdithienothiophene (BDTT)-based fused-thiophene derivatives (FPP-DTT; 1 and FPP-BDTT; 3) were synthesized and characterized for organic thin-film transistor (OTFT) applications. For comparison, symmetric phenyl end-capped dithienothiophene and bisdithienothiophene derivatives DP-DTT (2) and DP-BDTT (4) were also explored in parallel. The crystal structures of all four molecules were determined via single-crystal X-ray diffraction. Asymmetric compounds 1 and 3 exhibit face-to-face pi-pi stacking, while symmetric 2 and 4 show herringbone stacking. Single-crystal and thin-film transistors based on these four materials were fabricated. For single-crystal transistors, asymmetric FPP-DTT and FPP-BDTT gave high p-channel mobilities of 0.74 and 0.73 cm(2) V-1 s(-1), respectively, as well as current on/off ratios of similar to 10(5). Symmetric DP-DTT and DP-BDTT gave relatively lower p-channel mobilities of 0.36 and 0.41 cm(2) V-1 s(-1), respectively. For thin-film transistors, FPP-DTT and DP-DTT films deposited at 25 degrees C exhibited decent p-channel characteristics with a carrier mobility as high as 0.15 and 0.20 cm(2) V-1 s(-1), respectively for top-contact/bottom-gate OTFT devices. The device characteristics on various gate dielectrics have been correlated with the film morphologies and microstructures of the corresponding compounds.
引用
收藏
页码:8892 / 8902
页数:11
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