Multiwavelength Single Nanowire InGaAs/InP Quantum Well Light-Emitting Diodes

被引:34
|
作者
Yang, Inseok [1 ]
Li, Ziyuan [1 ]
Wong-Leung, Jennifer [1 ]
Zhu, Yi [1 ,2 ]
Li, Zhe [3 ]
Gagrani, Nikita [1 ]
Li, Li [4 ]
Lockrey, Mark N. [4 ]
Hieu Nguyen [2 ]
Lu, Yuerui [2 ]
Tan, Hark Hoe [1 ]
Jagadish, Chennupati [1 ]
Fu, Lan [1 ]
机构
[1] Australian Natl Univ, Dept Elect Mat Engn, Res Sch Phys & Engn, Canberra, ACT 2601, Australia
[2] Australian Natl Univ, Res Sch Elect Energy & Mat Engn, Canberra, ACT 2601, Australia
[3] Australian Natl Univ, Dept Appl Math, Res Sch Phys & Engn, Canberra, ACT 2601, Australia
[4] Australian Natl Univ, Australian Natl Fabricat Facil, Res Sch Phys & Engn, Canberra, ACT 2601, Australia
基金
澳大利亚研究理事会;
关键词
Selective area epitaxy; MOCVD; nanowires; InGaAs/InP quantum wells; single nanowire LEDs; AS-P EXCHANGE; SOLAR-CELLS; N-JUNCTION; SILICON; LASERS; GROWTH; EFFICIENCY; EPITAXY;
D O I
10.1021/acs.nanolett.9b00959
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report multiwavelength single InGaAs/InP quantum well nanowire light-emitting diodes grown by metal organic chemical vapor deposition using selective area epitaxy technique and reveal the complex origins of their electroluminescence properties. We observe that the single InGaAs/InP quantum well embedded in the nanowire consists of three components with different chemical compositions, axial quantum well, ring quantum well, and radial quantum well, leading to the electroluminescence emission with multiple wavelengths. The electroluminescence measurements show a strong dependence on current injection levels as well as temperatures and these are explained by interpreting the equivalent circuits in a minimized area of the device. It is also found that the electroluminescence properties are closely related to the distinctive triangular morphology with an inclined facet of the quantum well nanowire. Our study provides important new insights for further design, growth, and fabrication of high-performance quantum well-based nanowire light sources for a wide range of future optoelectronic and photonic applications.
引用
收藏
页码:3821 / 3829
页数:9
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