Numerical Modeling of an RF Argon-Silane Plasma with Dust Particle Nucleation and Growth

被引:44
作者
Agarwal, Pulkit [1 ]
Girshick, Steven L. [1 ]
机构
[1] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA
基金
美国国家科学基金会;
关键词
Dusty plasmas; Silane; Nanoparticles; CHEMICAL-VAPOR-DEPOSITION; LOW-PRESSURE PLASMAS; DISCHARGES; SILICON; COAGULATION; TIME; COEFFICIENTS; SIMULATION; CHEMISTRY; EVOLUTION;
D O I
10.1007/s11090-013-9511-3
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
A one-dimensional numerical model and simulation results are presented for a capacitively-coupled radio frequency parallel-plate argon-silane dusty plasma. The model includes self-consistently coupled numerical modules, including a plasma fluid model, a sectional aerosol model, and a simple chemistry model to predict rates of particle nucleation and surface growth. Operating conditions considered include 13.56 MHz frequency, 100 mTorr pressure, a 4-cm electrode gap, gas flow through the top electrode with a 30:1 ratio of argon to silane, and applied radio frequency voltage amplitude of either 100 or 250 V. In the higher voltage case two lobes of relatively large particles are formed by ion drag, while fresh nucleation occurs in the void between these lobes. It is shown that the reason that fresh nucleation occurs in the void involves an interplay among several coupled phenomena, including nanoparticle transport, the plasma potential profile, and trapping of silicon hydride anions that drive nucleation in this system.
引用
收藏
页码:489 / 503
页数:15
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