Strain distribution in MgxZn1-xO layers with various content of Mg grown on a-plane sapphire by plasma-assisted molecular beam epitaxy

被引:17
作者
Wierzbicka, A. [1 ]
Pietrzyk, M. A. [1 ]
Reszka, A. [1 ]
Dyczewski, J. [1 ]
Sajkowski, J. M. [1 ]
Kozanecki, A. [1 ]
机构
[1] Polish Acad Sci, Inst Phys, Aleja Lotnikow 32-46, PL-02668 Warsaw, Poland
关键词
X-ray diffraction; Zinc oxide; Strain; Mg doping; THIN-FILMS; SUBSTRATE; QUALITY; ZNO;
D O I
10.1016/j.apsusc.2017.01.218
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Dependence of strain distribution on Mg concentration in MgxZn1-xO layers on a-plane sapphire substrate grown by plasma-assisted molecular beam epitaxy was examined. Accurate determination of lattice parameters was performed using high resolution X-ray diffraction technique. Concentration of Mg was established by Rutherford backscattering spectrometry. These results show the non-linear relationship between the lattice parameters and Mg concentration. We observe the gradual gain of strain with the increase of Mg content in MgxZn1-xO layers, in particular in c-direction. Besides epitaxial layers on a-plane sapphire are biaxially strained similar to layers on c-plane sapphire. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:28 / 33
页数:6
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