Radiation damage studies on STAR250 CMOS sensor at 300keV for electron microscopy

被引:12
作者
Faruqi, A. R.
Henderson, R.
Holmes, J.
机构
[1] MRC, Mol Biol Lab, Cambridge CB2 2QH, England
[2] Sira Technol Ltd, Chislehurst BR7 5EH, Kent, England
基金
英国医学研究理事会;
关键词
CMOS; radiation hardness; electron microscopy; pixel detectors;
D O I
10.1016/j.nima.2006.04.066
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
There is a pressing need for better electronic detectors to replace film for recording high-resolution images using electron cryomicroscopy. Our previous work has shown that direct electron detection in CMOS sensors is promising in terms of resolution and efficiency at 120 keV [A.R. Faruqi, R. Henderson, M. Prydderch, R. Turchetta, P. Allport, A. Evans, Nucl. Instr. and Meth. 546 (2005) 170], but in addition, the detectors must not be damaged by the electron irradiation. We now present new measurements on the radiation tolerance of a 25 mu m pitch CMOS active-pixel sensor, the STAR250, which was designed by FillFactory using radiation-hard technology for space applications. Our tests on the STAR250 aimed to establish the imaging performance at 300keV following irradiation. The residual contrast, measured on shadow images of a 300 mesh grid, was > 80% after corrections for increased dark current, following irradiation with up to 5 x 10(7) electrons/pixel (equivalent to 80,000 electron/mu m(2)). A CMOS sensor with this degree of radiation tolerance would survive a year of normal usage for low-dose electron cryomicroscopy, which is a very useful advance. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:139 / 143
页数:5
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