Electron-beam induced growth of Cu nanoparticles in silica glass matrix

被引：17

作者：

Ito, Y ^{[1
]}

Jain, H ^{[1
]}

Williams, DB ^{[1
]}

机构：

[1] Lehigh Univ, Dept Mat Sci & Engn, Bethlehem, PA 18015 USA

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 24期

关键词：

D O I：

10.1063/1.125458

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The growth of nanometer-scale Cu metal particles in an amorphous SiO2 film was observed under a finely focused, intense electron beam in a dedicated scanning transmission electron microscope. Annular dark-field images show that the particle illuminated by the beam grows at the expense of surrounding Cu particles. Electron energy-loss spectroscopy was used for identifying the oxidation states of particles containing Cu atoms. An electric-field induced diffusion model explains the growth of metal particles in a dielectric medium. (C) 1999 American Institute of Physics. [S0003-6951(99)02450-X].

引用

页码：3793 / 3795

页数：3

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