Luminal Surface Engineering, 'Micro and Nanopatterning': Potential for Self Endothelialising Vascular Grafts?

被引:39
作者
Chong, D. S. T. [1 ,2 ]
Lindsey, B. [1 ]
Dalby, M. J. [3 ]
Gadegaard, N. [4 ]
Seifalian, A. M. [2 ]
Hamilton, G. [1 ,2 ]
机构
[1] Royal Free London NHS Fdn Trust, Dept Vasc Surg, London NW3 2QG, England
[2] UCL, Ctr Nanotechnol & Regenerat Med, Div Surg & Intervent Sci, London, England
[3] Univ Glasgow, Ctr Cell Engn, Glasgow, Lanark, Scotland
[4] Univ Glasgow, Sch Engn, Div Biomed Engn, Glasgow, Lanark, Scotland
基金
英国工程与自然科学研究理事会; 英国惠康基金; 英国生物技术与生命科学研究理事会;
关键词
Endothelialisation; Surface topography; Vascular grafts; BONDED EPTFE GRAFT; SAPHENOUS-VEIN; SIGNAL-TRANSDUCTION; SHEAR-STRESS; HUMAN BLOOD; CELLS; NANOSCALE; MICROTOPOGRAPHY; NANOTOPOGRAPHY; SCAFFOLDS;
D O I
10.1016/j.ejvs.2014.02.007
中图分类号
R61 [外科手术学];
学科分类号
摘要
Objective: New technologies are being explored to meet the clinical need for an 'off-the-shelf' small diameter vascular graft with superior or at least equivalent properties to autologous vessel. The field of nanotechnology and fabrication promises major advances in biomaterial design and wall structure to deliver biomimetic grafts. This review brings together recent work on this topic. Methods: A literature search was conducted of PubMed and ISI Web of Knowledge using relevant keywords: Articles published after January 2005 were given preference. Personal communications and PhD theses were also used as sources. Results: An evolving focus on surface patterning of biomaterials has been found to carry great potential. Influencing cellular behaviour on prosthetic grafts using graft luminal surface modulation at the micro- and nano-levels is the basis of this recent concept in vascular graft development. Conclusion: This technology may deliver small diameter grafts with the potential for spontaneous in situ endothelialisation without the need for prior 'seeding', with the potential to open a new chapter in vascular graft development. (C) 2014 European Society for Vascular Surgery. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:566 / 576
页数:11
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