Photocatalytic micropatterning of transparent ethylsilsesquioxane-titania hybrid films

被引：21

作者：

Matsuda, A ^{[1
]}

Sasaki, T ^{[1
]}

Tadanaga, K ^{[1
]}

Tatsumisago, M ^{[1
]}

Minami, T ^{[1
]}

机构：

[1] Osaka Prefecture Univ, Dept Appl Mat Sci, Grad Sch Engn, Sakai, Osaka 5998531, Japan

来源：

CHEMISTRY OF MATERIALS | 2002年 / 14卷 / 06期

关键词：

D O I：

10.1021/cm020118+

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Refractive index of ethylsilsesquioxane-titania hybrid films increased from 1.50 to 1.55 accompanied by a decrease in film thickness by about 30% after UV light irradiation. The contact angle for water of the films decreased from 95degrees to about 45degrees and the dynamic hardness increased with UV irradiation. These changes in physical and chemical properties of the films with UV irradiation were caused by the cleavage of silicon-carbon bonds and elimination of ethyl groups in the films due to the photocatalytic effect of the titania component. Micropatterning was successfully performed on the films coated on the substrates by UV irradiation through a photomask.

引用

页码：2693 / 2700

页数：8

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