Ultra-thin silicate films on metals

被引:20
作者
Shaikhutdinov, Shamil [1 ]
Freund, Hans-Joachim [1 ]
机构
[1] Max Planck Gesell, Fritz Haber Inst, Chem Phys Abt, D-14195 Berlin, Germany
关键词
silica; ultrathin films; surface structures; ELECTRONIC-STRUCTURE; ATOMIC-STRUCTURE; SURFACE SCIENCE; CRYSTALLINE SILICA; DIOXIDE FILMS; SINGLE-LAYER; SPECTROSCOPIC CHARACTERIZATION; SIO2/SI(100) INTERFACES; 2-DIMENSIONAL ZEOLITES; MO(112) SUBSTRATE;
D O I
10.1088/0953-8984/27/44/443001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Silica is one of the key materials in many modern technological applications. 'Surface science' approach for understanding surface chemistry on silica-based materials, on the one hand, and further miniaturization of new generation electronic devices, on the other, all these face the necessity of rational design of the ultrathin silica films on electrically conductive substrates. The review updates recent studies in this field. Despite the structural complexity and diversity of silica, substantial progress has recently been achieved in understanding of the atomic structure of truly 2D silicates.
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页数:15
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