Investigation on structural and electrochemical properties of binder free nanostructured nickel oxide thin film

被引：65

作者：

Duraisamy, Navaneethan ^{[1
]}

Numan, A. ^{[1
]}

Ramesh, K. ^{[1
]}

Choi, Kyung-Hyun ^{[2
]}

Ramesh, S. ^{[1
,3
]}

机构：

[1] Univ Malaya, Ctr Ion, Dept Phys, Fac Sci, Kuala Lumpur 50603, Malaysia

[2] Jeju Natl Univ, Dept Mechatron Engn, Jeju, South Korea

[3] Univ Malaya, Ctr Adv Mfg & Mat Proc, Dept Mech Engn, Kuala Lumpur 50603, Malaysia

来源：

MATERIALS LETTERS | 2015年 / 161卷

基金：

新加坡国家研究基金会;

关键词：

Deposition; Electrohydrodynamic atomization; Thin films; Surface morphology; Electrochemical study; SUPERCAPACITOR APPLICATION; POROUS NIO; PERFORMANCE; ELECTRODES; DEPOSITION;

D O I：

10.1016/j.matlet.2015.09.059

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Here, we report a simple method to achieve binder free nickel oxide (NiO) thin film using an electrohydrodynamic atomization (EHDA) process. The optimization of process parameters to obtain uniform thin film is discussed in detail. The high surface purity of nanostructured NiO film is oriented in the face centered cubic structure. The surface morphology revealed uniform deposition of anisotropic nanoplatelets morphology. The cyclic voltammetry and electrochemical impedance spectroscopy confirm the pseudocapacitance behavior of NiO film with a specific capacitance of 178 Fig. The cyclic test exhibits a good cyclic retention of 94% for 1200 cycles. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：694 / 697

页数：4

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