Nonradiative recombination centers in GaAsN Grown by Chemical Beam Epitaxy

被引:0
|
作者
Bouzazi, Boussairi [1 ]
Kojima, Nobuaki [1 ]
Ohshita, Yoshio [1 ]
Yamaguchi, Masafumi [1 ]
机构
[1] Toyota Technol Inst, Nagoya, Aichi 4868511, Japan
来源
2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC) | 2014年
关键词
GaAsN; CBE; DLTS; recombination centers;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Double carrier pulse deep level transient spectroscopy was deployed to identify and characterize the recombination centers in GaAsN grown by CBE. Six electron traps, E1 to E6, with average energy depths of 0.035, 0.125, 0.160, 0.365, 0.505, and 0.710 eV, respectively below the bottom edge of the conduction band minimum were observed. The DLTS peak heights of E2 and E4 were found to decrease with simultaneous injection of majority and minority carriers in the space charge region. This result is explained by the recombination of electrons and holes via E2 and E4 centers. The recombination processes were confirmed to be non radiative and the possible origins of these two defects were expected to be related to the N-atom.
引用
收藏
页码:1132 / 1134
页数:3
相关论文
共 50 条
  • [1] Optical DLTS For The Study Of Recombination Centers In GaAsN Grown By Chemical Beam Epitaxy
    Kowaki, Hiroyuki
    Lee, Kan-Hua
    Kojima, Takuto
    Inagaki, Makoto
    Ikeda, Kazuma
    Bouzazi, Boussairi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    Ekins-Daukes, N. J.
    9TH INTERNATIONAL CONFERENCE ON CONCENTRATOR PHOTOVOLTAIC SYSTEMS (CPV-9), 2013, 1556 : 41 - 44
  • [2] Effect of electron and proton irradiation on recombination centers in GaAsN grown by chemical beam epitaxy
    Bouzazi, Boussairi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    CURRENT APPLIED PHYSICS, 2013, 13 (07) : 1269 - 1274
  • [3] A recombination center in p-type GaAsN grown by chemical beam epitaxy
    Bouzazi, Boussairi
    Suzuki, Hidetoshi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2011, 95 (01) : 281 - 283
  • [4] Nitrogen-Related Recombination Center in GaAsN Grown by Chemical Beam Epitaxy
    Bouzazi, Boussairi
    Suzuki, Hidetoshi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (05) : 0510011 - 0510014
  • [5] Origin Investigation of a Nitrogen-Related Recombination Center in GaAsN Grown by Chemical Beam Epitaxy
    Bouzazi, Boussairi
    Lee, Jong-Han
    Suzuki, Hidetoshi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (05)
  • [6] Electrical properties of GaAsN film grown by chemical beam epitaxy
    Nishimura, K.
    Suzuki, H.
    Saito, K.
    Ohshita, Y.
    Kojima, N.
    Yamaguchi, M.
    PHYSICA B-CONDENSED MATTER, 2007, 401 (343-346) : 343 - 346
  • [7] Effect of Thermal Stress on a N-Related Recombination Center in GaAsN Grown by Chemical Beam Epitaxy
    Bouzazi, Boussairi
    Kojima, Nobuaki
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (02)
  • [8] Reduction of residual carbon in GaAsN films grown by chemical beam epitaxy
    Suzuki, Hidetoshi
    Nishimura, Kenichi
    Lee, Hae-Seok
    Saito, Kenji
    Kawalhigashi, Tetsuya
    Imai, Takahlro
    Ohshita, Yoshio
    Yamaguchi, Masafumi
    CONFERENCE RECORD OF THE 2006 IEEE 4TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION, VOLS 1 AND 2, 2006, : 819 - 822
  • [9] ORIGIN OF NONRADIATIVE RECOMBINATION CENTERS IN ALGAINP GROWN BY METALORGANIC VAPOR-PHASE EPITAXY
    KONDO, M
    OKADA, N
    DOMEN, K
    SUGIURA, K
    ANAYAMA, C
    TANAHASHI, T
    JOURNAL OF ELECTRONIC MATERIALS, 1994, 23 (03) : 355 - 358
  • [10] Studies of deep centers in dilute GaAsN and InGaAsN films grown by molecular beam epitaxy
    Polyakov, AY
    Smirnov, NB
    Govorkov, AV
    Botchkarev, AE
    Nelson, NN
    Fahmi, MME
    Griffin, JA
    Khan, A
    Mohammad, SN
    Johnstone, DK
    Bublik, VT
    Chsherbatchev, KD
    Voronova, MI
    Kasatochkin, VS
    SOLID-STATE ELECTRONICS, 2002, 46 (12) : 2155 - 2160