Polarization aberration analysis in optical lithography systems

被引：20

作者：

Kye, Jongwook ^{[1
]}

McIntyre, Gregory ^{[2
]}

Norihiro, Yamamoto ^{[3
]}

Levinson, Harry J. ^{[1
]}

机构：

[1] Adv Micro Devices Inc, 1 AMD Pl, Sunnyvale, CA USA

[2] Univ Calif Berkeley, EECS, Berkeley, CA 94720 USA

[3] Spansion Inc, Sunnyvale, CA USA

来源：

OPTICAL MICROLITHOGRAPHY XIX, PTS 1-3 | 2006年 / 6154卷

关键词：

ultra-high NA; polarization aberration; Zernike polynomials; Jones calculus; Pauli spin matrix; Stokes parameter; coherency matrix;

D O I：

10.1117/12.656864

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The use of immersion technology extends the lifetime of optical lithography by enabling ultra-high NA much greater than 1.0. Ultra-high NA application for low k(1) imaging strongly demands an adoption of polarization illumination as a resolution enhancement technology. It is typically assumed that the transmitted wavefront has uniform amplitude and a constant polarization state across the pupil. This assumption is not valid any more for the level required for low k(1) imaging. This paper considers methods of polarization analysis including polarization aberration theory. Definitions of basic polarization phenomena and review of matrix representation are included in this discussion. Finally we propose Pauli spin matrix representation as preferred method to describe polarization aberration.

引用

页码：U244 / U254

页数：11

共 21 条

[1] Exponential versions of the Jones and Mueller-Jones polarization matrices [J].