Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth

被引：6

作者：

Tsong, TT ^{[1
]}

Fu, TY ^{[1
]}

机构：

[1] NATL TAIWAN NORMAL UNIV,DEPT PHYS,TAIPEI,TAIWAN

来源：

APPLIED SURFACE SCIENCE | 1997年 / 121卷

关键词：

D O I：

10.1016/S0169-4332(97)00258-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending or an ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps. (C) 1997 Elsevier Science B.V.

引用

页码：34 / 43

页数：10

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