Evolution of micro solder joints under electromigration and elastic field

被引:9
作者
Kim, Dongchol [1 ]
机构
[1] Sogang Univ, Dept Mech Engn, Seoul 121742, South Korea
关键词
Solder joint; Electromigration; Diffusion; Stress gradient; Diffuse interface model; UNDER-BUMP-METALLIZATION; INTERFACIAL REACTIONS; CURRENT-DENSITY; EUTECTIC SNPB; FAILURE; INTERCONNECTS; MODEL;
D O I
10.1007/s12206-009-0111-3
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
This paper proposes a three-dimensional model for the evolution of micro and sub-micro scale flip chip solder joints. The Coupled mechanisms of electromigration and the corresponding stress gradient are incorporated into a diffuse interface model. A semi-implicit Fourier spectral method and the preconditioned biconjugate-gradient method are proposed for the computation to achieve high efficiency and numerical stability. Our simulations demonstrate dynamic evolution of solder joints and breakages at the interface on the cathode side. It is also shown that the dynamically incorporated stress gradient considerably affects the evolution of solder joints Counteracting the electromigration process.
引用
收藏
页码:489 / 497
页数:9
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