Droplet-vaporization behavior during plasma-assisted mist chemical vapor deposition of zinc oxide films

被引：8

作者：

Takenaka, Kosuke ^{[1
]}

Setsuhara, Yuichi ^{[1
]}

机构：

[1] Osaka Univ, Joining & Welding Res Inst, Ibaraki, Osaka 5670047, Japan

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2019年 / 28卷 / 06期

基金：

日本学术振兴会;

关键词：

plasma assisted mist CVD; droplet; textured ZnO; mist; ZNO FILMS; THIN-FILMS; GAS SENSOR; TRANSPARENT; TEMPERATURE; TRANSISTOR; PARTICLES; CELLS;

D O I：

10.1088/1361-6595/ab2703

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Droplet vaporization behavior during plasma-assisted mist chemical vapor deposition of zinc oxide films was investigated. The time required for a droplet to fully evaporate is simulated as a function of the initial droplet temperature, droplet-vapor interactions, and initial droplet size. Droplets injected into the plasma are vaporized by the heat flux from the plasma. It was found that micrometric size droplets evaporate completely within several microseconds due to heat flux from the plasma. Moreover, owing to differences in vaporization rates, solid particles were formed from some of the droplets during their passage through the plasma, but other droplets formed incomplete particles or remained as droplets due to incomplete evaporation. Particles formed in the plasma and subsequently deposited on a substrate maintained their shape.

引用

页数：8

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