Design Space Reparameterization Enforces Hard Geometric Constraints in Inverse-Designed Nanophotonic Devices

被引:38
作者
Chen, Mingkun [1 ]
Jiang, Jiaqi [1 ]
Fan, Jonathan A. [1 ]
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
关键词
reparameterization; inverse design; machine learning; nanophotonics; fabrication constraints; metasurfaces; ROBUST TOPOLOGY OPTIMIZATION; ASPECT-RATIO; SILICON; LITHOGRAPHY;
D O I
10.1021/acsphotonics.0c01202
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Inverse design algorithms are the basis for realizing high-performance, freeform nanophotonic devices. Current methods to enforce geometric constraints, such as practical fabrication constraints, are heuristic and not robust. In this work, we show that hard geometric constraints can be imposed on inverse-designed devices by reparameterizing the design space itself. Instead of evaluating and modifying devices in the physical device space, candidate device layouts are defined in a constraint-free latent space and mathematically transformed to the physical device space, which robustly imposes geometric constraints. Modifications to the physical devices, specified by inverse design algorithms, are made to their latent space representations using backpropagation. As a proof-of-concept demonstration, we apply reparameterization to enforce strict minimum feature size constraints in local and global topology optimizers for metagratings. We anticipate that concepts in reparameterization will provide a general and meaningful platform to incorporate physics and physical constraints in any gradient-based optimizer, including machine learning-enabled global optimizers.
引用
收藏
页码:3141 / 3151
页数:11
相关论文
共 45 条
[21]   TCAD development for lithography resolution enhancement [J].
Liebmann, LW ;
Mansfield, SM ;
Wong, AK ;
Lavin, MA ;
Leipold, WC ;
Dunham, TG .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2001, 45 (05) :651-665
[22]   Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures [J].
Marty, F ;
Rousseau, L ;
Saadany, B ;
Mercier, B ;
Francais, O ;
Mita, Y ;
Bourouina, T .
MICROELECTRONICS JOURNAL, 2005, 36 (07) :673-677
[23]   Inverse Design of Photonic Crystals through Automatic Differentiation [J].
Minkov, Momchil ;
Williamson, Ian A. D. ;
Andreani, Lucio C. ;
Gerace, Dario ;
Lou, Beicheng ;
Song, Alex Y. ;
Hughes, Tyler W. ;
Fan, Shanhui .
ACS PHOTONICS, 2020, 7 (07) :1729-1741
[24]   Inverse design in nanophotonics [J].
Molesky, Sean ;
Lin, Zin ;
Piggott, Alexander Y. ;
Jin, Weiliang ;
Vuckovic, Jelena ;
Rodriguez, Alejandro W. .
NATURE PHOTONICS, 2018, 12 (11) :659-670
[25]  
Ng E. J., 2013, 2013 Transducers & Eurosensors XXVII: 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), P182, DOI 10.1109/Transducers.2013.6626732
[26]  
Paszke A, 2019, ADV NEUR IN, V32
[27]   High-efficiency, large-area, topology-optimized metasurfaces [J].
Phan, Thaibao ;
Sell, David ;
Wang, Evan W. ;
Doshay, Sage ;
Edee, Kofi ;
Yang, Jianji ;
Fan, Jonathan A. .
LIGHT-SCIENCE & APPLICATIONS, 2019, 8 (1)
[28]  
Piggott AY, 2015, NAT PHOTONICS, V9, P374, DOI [10.1038/NPHOTON.2015.69, 10.1038/nphoton.2015.69]
[29]   Robust topology optimization accounting for spatially varying manufacturing errors [J].
Schevenels, M. ;
Lazarov, B. S. ;
Sigmund, O. .
COMPUTER METHODS IN APPLIED MECHANICS AND ENGINEERING, 2011, 200 (49-52) :3613-3627
[30]   Ultra-High-Efficiency Anomalous Refraction with Dielectric Metasurfaces [J].
Sell, David ;
Yang, Jianji ;
Wang, Evan W. ;
Phan, Thaibao ;
Doshay, Sage ;
Fan, Jonathan A. .
ACS PHOTONICS, 2018, 5 (06) :2402-2407