Designs of Plasmonic Metamasks for Photopatterning Molecular Orientations in Liquid Crystals

被引:29
|
作者
Guo, Yubing [1 ]
Jiang, Miao [1 ]
Peng, Chenhui [1 ]
Sun, Kai [2 ]
Yaroshchuk, Oleg [3 ]
Lavrentovich, Oleg D. [1 ]
Wei, Qi-Huo [1 ]
机构
[1] Kent State Univ, Inst Liquid Crystal, Kent, OH 44242 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[3] Natl Acad Sci Ukraine, Inst Phys, UA-03028 Kiev, Ukraine
来源
CRYSTALS | 2017年 / 7卷 / 01期
基金
美国国家科学基金会;
关键词
liquid crystals; plasmonic metamasks; photoalignment; nanofabrication; LIGHT; PHOTOALIGNMENT; LITHOGRAPHY; MATTER; SHAPE; FILM;
D O I
10.3390/cryst7010008
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Aligning liquid crystal (LC) molecules into spatially non-uniform orientation patterns is central to the functionalities of many emerging LC devices. Recently, we developed a new projection photopatterning technique by using plasmonic metamasks (PMMs), and demonstrated high-resolution and high-throughput patterning of molecular orientations into arbitrary patterns. Here we present comparisons between two different types of metamask designs: one based on curvilinear nanoslits in metal films; the other based on rectangular nanoapertures in metal films. By using numerical simulations and experimental studies, we show that the PMMs based on curvilinear nanoslits exhibit advantages in their broadband and high optical transmission, while face challenges in mask designing for arbitrary molecular orientations. In contrast, the PMMs based on nanoapertures, though limited in optical transmission, present the great advantage of allowing for patterning arbitrary molecular orientation fields.
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页数:11
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