Epitaxial UN and α-U2N3 thin films

被引：16

作者：

Bright, E. Lawrence ^{[1
]}

Rennie, S. ^{[1
]}

Cattelan, M. ^{[2
]}

Fox, N. A. ^{[1
,2
]}

Goddard, D. T. ^{[3
]}

Springell, R. ^{[1
]}

机构：

[1] Univ Bristol, Sch Phys, Tyndall Ave, Bristol BS8 1TL, Avon, England

[2] Univ Bristol, Sch Chem, Cantocks Close, Bristol BS8 1TL, Avon, England

[3] Preston Lab, Natl Nucl Lab, Preston PR4 0XJ, Lancs, England

来源：

THIN SOLID FILMS | 2018年 / 661卷

基金：

英国工程与自然科学研究理事会;

关键词：

Uranium nitride; Epitaxial growth; X-ray diffraction; X-ray photoelectron spectroscopy; URANIUM MONONITRIDE; ELECTRONIC-STRUCTURE; X-RAY; THERMAL-CONDUCTIVITY; NITRIDE; OXIDATION; HYDROLYSIS; CARBIDES; NIOBIUM; DENSITY;

D O I：

10.1016/j.tsf.2018.07.018

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Single crystal epitaxial thin films of UN and alpha-U2N3 have been grown for the first time by reactive DC magnetron sputtering. These films provide ideal samples for fundamental research into the potential accident tolerant fuel, UN, and U2N3 , its intermediate oxidation product. Films were characterised using x-ray diffraction (XRD) and x-ray photoelectron spectroscopy (XPS), with XRD analysis showing both thin films to be [001] oriented and composed of a single domain. The specular lattice parameters of the UN and U2N3 films were found to be 4.895 angstrom and 10.72 angstrom, respectively, with the UN film having a miscut of 2.6 degrees. XPS showed significant differences in the N-1 s peak between the two films, with area analysis showing both films to be stoichiometric.

引用

页码：71 / 77

页数：7

共 31 条

[1] OXIDATION OF URANIUM-DIOXIDE AT 298-DEGREES-K STUDIED BY USING X-RAY PHOTO-ELECTRON SPECTROSCOPY [J].

ALLEN, GC ;

TUCKER, PM ;

TYLER, JW .

JOURNAL OF PHYSICAL CHEMISTRY, 1982, 86 (02) :224-228

[2] NIOBIUM - LATTICE PARAMETER AND DENSITY [J].

BARNS, RL .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (08) :4044-&

[3] GenX:: an extensible X-ray reflectivity refinement program utilizing differential evolution [J].

Bjorck, Matts ;

Andersson, Gabriella .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 2007, 40 :1174-1178

[4] Preparation and photoelectron spectroscopy study of UNx thin films [J].

Black, L ;

Miserque, F ;

Gouder, T ;

Havela, L ;

Rebizant, J ;

Wastin, F .

JOURNAL OF ALLOYS AND COMPOUNDS, 2001, 315 (1-2) :36-41

[5] EPITAXIAL-GROWTH OF NIOBIUM THIN-FILMS [J].

CLAASSEN, JH ;

WOLF, SA ;

QADRI, SB ;

JONES, LD .

JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) :557-561

[6] AN INVESTIGATION OF MAGNETIC STRUCTURE OF URANIUM NITRIDE BY NEUTRON DIFFRACTION [J].

CURRY, NA .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1965, 86 (554P) :1193-&

[7] HYDROLYSIS OF URANIUM MONONITRIDE [J].

DELL, RM ;

WHEELER, VJ ;

BRIDGER, NJ .

TRANSACTIONS OF THE FARADAY SOCIETY, 1967, 63 (533P) :1286-&

[8] Photoemission study of UNxOy and UCxOy in thin films [J].

Eckle, M ;

Gouder, T .

JOURNAL OF ALLOYS AND COMPOUNDS, 2004, 374 (1-2) :261-264

[9] Itinerant nature of U 5f states in uranium mononitride revealed by angle-resolved photoelectron spectroscopy [J].

Fujimori, Shin-ichi ;

Ohkochi, Takuo ;

Okane, Tetsuo ;

Saitoh, Yuji ;

Fujimori, Atsushi ;

Yamagami, Hiroshi ;

Haga, Yoshinori ;

Yamamoto, Etsuji ;

Onuki, Yoshichika .

PHYSICAL REVIEW B, 2012, 86 (23)

[10] Oxidation of vanadium nitride and titanium nitride coatings [J].

Glaser, A. ;

Surnev, S. ;

Netzer, F. P. ;

Fateh, N. ;

Fontalvo, G. A. ;

Mitterer, C. .

SURFACE SCIENCE, 2007, 601 (04) :1153-1159

← 1 2 3 4 →