Optimization of near-field optical field of multi-layer dielectric gratings for pulse compressor

被引：41

作者：

Liu, Shijie

Shen, Zicai

Kong, Weijing

Shen, Jian

Deng, Zhenxia

Zhao, Yuanan

Shao, Jianda

Fan, Zhengxiu

机构：

[1] Chinese Acad Sci Res & Dev, Ctr Opt Thin Film, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China

[2] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China

来源：

OPTICS COMMUNICATIONS | 2006年 / 267卷 / 01期

基金：

中国国家自然科学基金;

关键词：

diffractive optics; pulse compression gratings-; Fourier modal method; multi-layer dielectric film; laser induced damage threshold;

D O I：

10.1016/j.optcom.2006.06.022

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Multi-layer dielectric (MLD) gratings for pulse compressors in high-energy laser systems should provide high diffraction efficiency as well as high laser induced damage thresholds (LIDT). Nonuniform optical near-field distribution is one of the important factors to limit their damage resistant capabilities. Electric field distributions in the gratings and multi-layer film region are analyzed by using Fourier modal method. Optimization of peak electric field in the gratings ridge is performed with a merit function, including both diffraction efficiency and electric field enhancement when the top layer material is HfO2 and SiO2, respectively. A set of optimized gratings parameters is obtained for each structure, which reduce the peak electric field within the gratings ridge to being respective 1.39 and 1.84 times the value of incident light respectively. Finally, we also discuss the effects of gratings refractive index, gratings sidewall angle and incident angle on peak electric field in the gratings ridge. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：50 / 57

页数：8

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