Wafer-level fabrication of alkali vapor cells using in-situ atomic deposition

被引:26
作者
Bopp, D. G. [1 ,2 ]
Maurice, V. M. [1 ,2 ]
Kitching, J. E. [2 ]
机构
[1] Univ Colorado, Dept Phys, Boulder, CO 80302 USA
[2] NIST, Time & Frequency Div, Boulder, CO 80305 USA
来源
JOURNAL OF PHYSICS-PHOTONICS | 2021年 / 3卷 / 01期
关键词
microfabricated vapor cells; parallel fabrication; compact atomic devices; atomic spectroscopy; OPTICAL DETECTION; D-2; LINES; CHIP; N-2;
D O I
10.1088/2515-7647/abcbe5
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate a new technique for filling mm-scale microfabricated silicon and glass cavities with alkali vapors at the wafer-scale. A single etched silicon wafer contains an array of cavities containing alkali precursor materials offset laterally from the cell array. The wafer is heated to create an array of alkali droplets on an upper glass wafer, which is then translated laterally under vacuum and bonded to create the cells. This technique can be implemented in a commercially available bonding tool, allows the fabrication of cells with arbitrary buffer gas contents and pressures and can potentially produce cells with dimensions below 100 mu m.
引用
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页数:7
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