InN Thin Films Deposition by rf Magnetron Sputtering

被引：0
|
作者：
Braic, Mariana T. [1 ]
Zoita, Catalin N. [1 ]
Braic, Viorel T. [1 ]
Toacsan, Mariana I. [2 ]
Ioachim, Andrei T. [2 ]
机构：
[1] Natl Inst Optoelect, RO-77125 Magurele, Romania
[2] Natl Inst Mat Phys, RO-77125 Magurele, Romania
来源：
2008 33RD INTERNATIONAL CONFERENCE ON INFRARED, MILLIMETER AND TERAHERTZ WAVES, VOLS 1 AND 2 | 2008年
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
InN thin films were grown by reactive magnetron sputtering in a UHV system, using Ar and N-2 as working gases. Electrical and optical investigations of the films were correlated with their structural and morphological characteristics in order to obtain good quality films for THz applications.
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页码：709 / +
页数：2
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