High-Efficiency Low-Crosstalk 1310-nm Polarization Splitter and Rotator

被引：31

作者：

Guan, Hang ^{[1
]}

Novack, Ari ^{[1
]}

Streshinsky, Matthew ^{[1
]}

Shi, Ruizhi ^{[1
]}

Liu, Yang ^{[2
]}

Fang, Qing ^{[3
]}

Lim, Andy Eu-Jin ^{[3
]}

Lo, Guo-Qiang ^{[3
]}

Baehr-Jones, Tom ^{[2
]}

Hochberg, Michael ^{[1
,2
]}

机构：

[1] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 119077, Singapore

[2] Univ Delaware, Dept Elect & Comp Engn, Newark, DE 19716 USA

[3] Agcy Sci Technol & Res, Inst Microelect, Singapore 117685, Singapore

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2014年 / 26卷 / 09期

关键词：

Integrated optics; polarization splitter and rotator; silicon-on-insulator (SoI); SILICON;

D O I：

10.1109/LPT.2014.2310635

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate the first example of a polarization splitter and rotator (PSR) at 1310 nm built on a silicon-on-insulator platform using 248-nm deep-ultraviolet lithography. The PSR is constructed with a directional coupler, a bilevel taper-based TM0-to-TE1 mode converter, and an asymmetric Mach-Zehnder-based TE1-to-TE0 mode converter. A worst-case TM0-to-TE0 mode-conversion loss of 2 dB, with polarization crosstalk lower than -20 dB over a wide bandwidth of 40 nm is experimentally demonstrated. The worst-case polarization-dependent loss is 0.76 dB.

引用

页码：925 / 928

页数：4

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